To provide an alignment method of a mask inspection device that can shorten an alignment time.
Disclosed is the alignment method of the mask inspection device characterized in: relating and storing image data of alignment marks and coordinate data of length-measured stage positions; calculating the gradient of an alignment in an acquired image of the alignment mark from the acquired image; calculating the gradient of a stage travel direction to a stage coordinate axis from coordinate data of a stage position related to the acquired image of the alignment mark; calculating the actual gradient between a mask and the stage coordinate axis from the calculated gradient of the alignment mark in the acquired image and the calculated gradient of the stage travel direction to the stage coordinate axis; and correcting rotation of the mask based upon the gradient between the mask and stage coordinate axis which is calculated as to only the acquired image of the alignment at one place.
Yuichi Kasai
Tetsuma Ikegami
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