Title:
ALIGNMENT METHOD, IMPRINT METHOD, AND IMPRINT DEVICE
Document Type and Number:
Japanese Patent JP2016143875
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an alignment method which allows for improvement in the alignment accuracy of a mold and a substrate in the imprint method, and to provide an imprint method including the alignment method, and an imprint device.SOLUTION: An alignment method includes a lamination step for laminating a mold having a mold side alignment mark consisting of a convex portion or a recess, a resin composition layer composed of a resin composition containing a fluorescent dye and having liquidity, and a having a substrate side alignment mark consisting of a projecting portion or a recess, in this order, a detection step for detecting misalignment of the mold side alignment mark and substrate side alignment mark by the local difference of fluorescence intensity based on the difference of local thickness of the resin composition layer, and a patterned substrate alignment step for moving the patterned substrate for the mold in a direction for reducing the misalignment thus detected.SELECTED DRAWING: Figure 4
Inventors:
MATSUBARA SHINYA
ABE MASAYUKI
ISHIDO YOTA
KUBO SHOICHI
NAKAGAWA MASARU
ABE MASAYUKI
ISHIDO YOTA
KUBO SHOICHI
NAKAGAWA MASARU
Application Number:
JP2015021538A
Publication Date:
August 08, 2016
Filing Date:
February 05, 2015
Export Citation:
Assignee:
ASAHI KASEI CORP
UNIV TOHOKU
UNIV TOHOKU
International Classes:
H01L21/027; B29C43/36
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Foreign References:
| US20120021140A1 | 2012-01-26 |
Other References:
SHOICHI KUBO, ET.AL.: "Resolution Limits of Nanoimprinted Patterns by Fluorescence Microscopy", JPN.J.APPL.PHYS., vol. 52, JPN6019000715, 20 June 2013 (2013-06-20), JP, pages 01 - 1, ISSN: 0003957495
Attorney, Agent or Firm:
Tetsuya Mori
Hide Tanaka Tetsu
Hide Tanaka Tetsu
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