ALIGNMENT METHOD IN EXPOSURE DEVICE

Title:

ALIGNMENT METHOD IN EXPOSURE DEVICE

Document Type and Number:

Japanese Patent JP2006229119

Kind Code:

A

Abstract:

To provide an alignment method in a substrate exposure device for aligning without using an alignment mark, and a manufacturing method for a mask using this method.

After mounting a substrate on the exposure device, a position and inclination of the substrate is calculated by measuring points on an outer periphery of the substrate, and an exposure pattern, and a position and inclination of the mask are corrected to exposure an arbitrary position on the substrate. Using this method, the pattern exposed by overlaying and the position and inclination of the mask are corrected by suiting to the position of the pattern previously exposed on the substrate, to expose by overlaying. Further in the overlay exposure, overlay exposure is performed on both surfaces of the substrate.

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Inventors:

KOJIMA TOMOAKI
HOSHINO TAKAYUKI
KATO TAKASHI

Application Number:

JP2005043836A

Publication Date:

August 31, 2006

Filing Date:

February 21, 2005

Export Citation:

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Assignee:

ULVAC SEIMAKU KK

International Classes:

H01L21/027; G01B11/00; G01B11/26; G03F9/00; H01L21/68

Attorney, Agent or Firm:

Takao Hamano
Morita Tetsuji
Teruichi Hirai

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