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Patent Searching and Data


Title:
Alignment system
Document Type and Number:
Japanese Patent JP6273078
Kind Code:
B2
Abstract:
An apparatus for determining alignment of a first subsystem relative to a second subsystem. The apparatus includes a first antenna system (102) for simultaneously transmitting a delta pattern radiation beam (116a) at a first frequency and a sum pattern radiation beam (116b) at a second frequency. The apparatus also includes a second antenna system (106) for receiving the delta pattern radiation beam at the first frequency and the sum pattern radiation beam at the second frequency. The apparatus also includes a processor (124) to process the received delta pattern radiation beam and sum pattern radiation beam to determine if a predetermined alignment criterion between the first antenna system and the second antenna system is satisfied.

Inventors:
Gilbert m shows
Jacob Kim
Application Number:
JP2011204987A
Publication Date:
January 31, 2018
Filing Date:
September 20, 2011
Export Citation:
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Assignee:
RAYTHEON COMPANY
International Classes:
G01S3/42; H01Q11/08
Domestic Patent References:
JP5747200A
JP6027867A
JP4142478A
JP7270525A
Foreign References:
WO2009134751A1
Attorney, Agent or Firm:
Axis International Patent Business Corporation