Title:
ALKALI-SOLUBLE RESIN AND PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2017160331
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an alkali-soluble resin that gives a cured film having particularly excellent solvent resistance, adhesion and developability and also having excellent heat resistance, and provide a photosensitive resin composition comprising such an alkali-soluble resin, a cured film made by curing the photosensitive resin composition, and a display device member and a display device which can improve the performances by having the cured film.SOLUTION: The alkali-soluble resin is obtained by living radical polymerization in the presence of organic tellurium compounds and has a ring structure in the main chain.SELECTED DRAWING: None
Inventors:
MINATOBE YUTA
YAMAGUCHI MINORU
YOSHIDA MASATOSHI
YAMAGUCHI MINORU
YOSHIDA MASATOSHI
Application Number:
JP2016045928A
Publication Date:
September 14, 2017
Filing Date:
March 09, 2016
Export Citation:
Assignee:
NIPPON CATALYTIC CHEM IND
International Classes:
C08F22/40; C08F2/48; C08F8/08; C08F290/12; G02B5/20; G03F7/004; G03F7/038
Attorney, Agent or Firm:
Atomi International Patent Office