ALLOY FOR GAS PURIFICATION AND GAS PURIFICATION PROCESS

Japanese Patent JP2935959

B2

PURPOSE: To produce an alloy capable of efficiently removing impurity components, particularly hydrocarbon and nitrogen, from a gas used for semiconductor manufacture, special lamps, etc., by specifying the composition of a Zr-base alloy.
CONSTITUTION: This alloy is an alloy for gas purification, having a composition represented by composition formula AxVyB2.0-y when A represents a combination of any of ZrHf, ZrMm, and ZrHfMm and B represents at least one element among Al, Fe, and W [where Mm means misch metal, V means vanadium, and (x) and (y) in the composition formula satisfy the conditions of 0.80≤x≤2.50 and 1.00≤y≤1.90, respectively]. It is preferable to add Ta and Mo further to the composition. At this time, the composition formula, when C(Ta, Mo) means at least either of Ta and Mo, is represented by AxVy(BC)2.0-y. At the time of gas purification, a powder of each alloy of ≤100μm grain size is pelletized and the resulting pellets are brought into contact with the gas to be purified and allowed to absorb the impurities in the gas.

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KAMINAKA HIDEYA
NEGI NORYUKI
TERANISHI HIROSHI
HARA MASAYUKI

JP30907594A

August 16, 1999

December 13, 1994

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SUMITOMO KINZOKU KOGYO KK
SUMIKIN MORI KOOPU KK

B01J20/02; B01J20/08; C22C16/00; C22C27/02; (IPC1-7): C22C16/00; B01J20/02; B01J20/08; C22C27/02

JP2159335A
JP5170405A
JP4259348A
JP368735A

Terutaka Hogami (1 person outside)

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