PURPOSE: To obtain a new nitrone compound, excellent in compatibility with resins, capable of forming fine resist patterns in high yield and useful as a principal component of a contrast enhanced material(CEM) for enhancing contrast.
CONSTITUTION: An α-[p-(diethylamino)phenyl]-N-(alkylphenyl)nitrone compound expressed by formula 1 (R1 to R5 are H or at least one is alkyl) e.g. α-[p-(diethylamino)phenyl]-N-(2,3-dimethylphenyl)nitrone. The above-mentioned compound can be synthesized by hydrogenating a compound expressed by formula 2 and then reacting the resultant compound expressed by formula 3 with a compound expressed by formula 4. Since the compound expressed by formula 1 has contrast enhancing properties especially for light (i rays) at 365nm wavelength and is excellent in compatibility with resins as a binder for a contrast enhanced material. Thereby, the objective contrast enhanced material capable of forming fine resist patterns having high contrast, high resolution and accuracy in high yield is obtained.
| JPS61250710 | Z AXIS DRIVER |
| JP2892706 | [Title of the Invention] A method for manufacturing a semiconductor device |
| JPH0199051 | SEMICONDUCTOR MANUFACTURING MASK |
ISHIHARA TOSHINOBU
ITO KENICHI
