Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ALUMINUM ALLOY SUBSTRATE FOR LITHOGRAPHIC PLATE AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JPH09310140
Kind Code:
A
Abstract:

To provide a substrate for lithographic plate, uniform in material, free from dispersion of electrolytic surface roughening property, and remarkably improved in bending strength, and its production.

This aluminum alloy substrate is composed of an aluminum alloy sheet having a composition containing, by weight, >0-0.20% Fe, >0-0.13% Si, and ≥99.7% Al and can be obtained by rolling molten aluminum directly into sheet-like state by means of twin roll, rolling this sheet to 0.5-0.1mm by means of cold rolling, performing straightening, and subjecting the resultant aluminum substrate 12 to surface roughening. Further, in the cutting surface 12a perpendicular to the direction of advance of the rolling, the thickness T and the width W of the crystalline grains located in the position at a depth of ≥5μm from the surface layer are regulated to 20-100μm and 100-5000μm respectively.


Inventors:
SAWADA HIROKAZU
SAKAKI HIROKAZU
MATSUURA KINYA
Application Number:
JP12351296A
Publication Date:
December 02, 1997
Filing Date:
May 17, 1996
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
B41N1/08; B21B3/00; B22D11/00; B22D11/06; B22D27/20; B41N3/03; C22C21/00; C22F1/04; C25F3/04; (IPC1-7): C22C21/00; B21B3/00; B22D11/00; B22D11/06; B22D27/20; B41N1/08; B41N3/03; C22F1/04; C25F3/04
Attorney, Agent or Firm:
萩野 平 (外3名)