PURPOSE: To uniformize the thickness of a coating and to improve adhesive strength by subjecting the surface of a cryopanel to polishing and cleaning under respectively specified conditions and then coating the above surface with Al by a cathodic sputtering method.
CONSTITUTION: The surface of a cryopanel used for a neutral particle incident apparatus is polished to ≥400mesh and then mechanically or chemically cleaned. Successively, the above surface is coated with Al by a cathodic sputtering method. As to sputtering conditions, the purity of an Al target material, an ultimate pressure in a vacuum tank, argon-charging pressure, impressed voltage, electric current, sputtering time, and presputtering time are regulated to ≥99.9%, ≤1×10-5Torr, ≤3×10-4Torr, DC500-600V, 0.7-0.9A, 120-140min, and 10-20min, respectively. Cleaning is carried out by means of washing with neutral detergents, immersion in trichlene, wiping with acetone, cleaning with freon vapor, etc.
SAWADA TAKAO
SHIBATA TAKEYORI
JAPAN ATOMIC ENERGY RES INST