Title:
AMMONIA RECOVERY METHOD
Document Type and Number:
Japanese Patent JP2014118309
Kind Code:
A
Abstract:
To provide a method capable of efficiently and easily recovering ammonia from low ammonia concentration exhaust gas discharged from a manufacturing process of a gallium nitride-based compound semiconductor.
Exhaust gas containing ammonia, hydrogen, and nitrogen discharged from a manufacturing process of a gallium nitride-based compound semiconductor is brought into contact with a hydrogen separation membrane to remove a part of the hydrogen from the exhaust gas, and then the exhaust gas is subjected to cooling treatment using a heat pump to liquefy and recover the ammonia contained in the exhaust gas. Preferably, the hydrogen separation membrane is a palladium alloy membrane.
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Inventors:
IZAKI HIROMASA
IWAKI MASANORI
AKIYAMA TOSHIO
IWAKI MASANORI
AKIYAMA TOSHIO
Application Number:
JP2012272731A
Publication Date:
June 30, 2014
Filing Date:
December 13, 2012
Export Citation:
Assignee:
JAPAN PIONICS
International Classes:
C01C1/12; B01D53/22; B01D53/52; B01D53/58; B01D71/02; C01B3/56
Domestic Patent References:
| JP2007019052A | 2007-01-25 | |||
| JPS6046918A | 1985-03-14 | |||
| JP2008007378A | 2008-01-17 | |||
| JP2007182359A | 2007-07-19 | |||
| JP2011207672A | 2011-10-20 |