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Patent Searching and Data


Title:
AMORPHOUS SEMICONDUCTOR DEVICE AND ITS MANUFACTURE
Document Type and Number:
Japanese Patent JP2000138384
Kind Code:
A
Abstract:

To provide a photovoltaic device improved in interface characteristics, and a manufacturing method thereof.

An amorphous semiconductor device is equipped with amorphous semiconductor layers 3 and 4, which are different from each other in conductivity-type, adjacent to each other in the vertical direction, and formed on a substrate 1, where a natural oxide layer b formed of a natural oxide of a main element contained in the amorphous semiconductor layer 3 arranged closer to the substrate 1 than the semiconductor layer 4 is provided between the adjacent amorphous semiconductor layers 3 and 4.


Inventors:
SAYAMA KATSUNOBU
NAKAJIMA TAKESHI
Application Number:
JP31046898A
Publication Date:
May 16, 2000
Filing Date:
October 30, 1998
Export Citation:
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Assignee:
SANYO ELECTRIC CO
International Classes:
H01L31/04; (IPC1-7): H01L31/04
Attorney, Agent or Firm:
Masano Shibano