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Title:
AMORPHOUS SILICON PHOTOCONDUCTOR LAYER
Document Type and Number:
Japanese Patent JPS57158650
Kind Code:
A
Abstract:

PURPOSE: To obtain a photoconductor layer for use in an electrophotographic receptor enhanced in sensitivity and dark resistance, by adding a specified amount of hydrogen to an amorphous silicon layer, and regulating the absorption coefficient ratio of the absorption peaks in specified infrared absorption spectra.

CONSTITUTION: A glow discharge decomposition device or the like, hydrogen as a carrier gas, and 0.3W3KW high frequency power are used, and gaseous SiH4, when needed, oxygen, and gaseous impurities of the group IIIA are decomposed to form an amorphous silicon (a-Si) photoconductor layer containing at least 10W 40 atomic % hydrogen, when needed, a slight amount of oxygen, and the impurities of the group IIIA on a substrate. This a-Si layer has the 0.2W1.7 absorption coefficient ratio of the peaks at 2,100-1 and 2,000cm-1 of infrared absorption spectra, thus permitting an electrophotographic photoconductor enhanced in sensitivity, dark resistance, manufacture reproducibility, and stability to be obtained.


Inventors:
KAWAMURA TAKAO
YOSHIDA MASAZUMI
Application Number:
JP4449981A
Publication Date:
September 30, 1982
Filing Date:
March 25, 1981
Export Citation:
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Assignee:
MINOLTA CAMERA KK
KAWAMURA TAKAO
KYOTO CERAMIC
International Classes:
G03G5/08; G03G5/082; H01L21/205; H01L31/0248; (IPC1-7): G03G5/08; H01L21/205; H01L31/08



 
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