Title:
ANALYSIS METHOD AND ANALYSIS DEVICE FOR PLATING SOLUTION, AND MANAGEMENT METHOD AND MANAGEMENT SYSTEM FOR PLATING BATH
Document Type and Number:
Japanese Patent JP2023078512
Kind Code:
A
Abstract:
To provide an analysis method and an analysis device for plating solution that can process data associated with a precipitation pattern obtained from a plating solution to analyze a state of the plating solution quantitatively under identical standards, and a management method and a management system for plating bath that uses the analysis method.SOLUTION: An analysis method for plating solution includes the steps of: inputting data associated with a precipitation pattern obtained from a plating solution; and using an analysis model machine-learnt using, as teacher data, the data or processing data obtained by processing the data so as to obtain an analysis result of the precipitation pattern or the plating solution on the basis of the data or the processing data.SELECTED DRAWING: Figure 7
Inventors:
AKIYAMA MASAHIRO
YODO YUSUKE
KAWAI YOUKEN
MIZUSHINA MANATO
WAKABAYASHI SHINICHI
TAKAYANAGI YUTA
YODO YUSUKE
KAWAI YOUKEN
MIZUSHINA MANATO
WAKABAYASHI SHINICHI
TAKAYANAGI YUTA
Application Number:
JP2021191664A
Publication Date:
June 07, 2023
Filing Date:
November 26, 2021
Export Citation:
Assignee:
INST NATIONAL COLLEGES TECH JAPAN
SUN KK CORP
SUN KK CORP
International Classes:
G01N27/416; C25D21/12; C25D21/14; G06T7/00
Attorney, Agent or Firm:
Hiroaki Saegusa