Title:
ANALYZER AND ELECTRONIC APPARATUS
Document Type and Number:
Japanese Patent JP2015212674
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an analyzer having hot spots exposed from a surface of an electric field enhancement element and a high plasmon enhancement effect.SOLUTION: An analyzer includes: a substrate 1; a first metal layer 10 formed on the substrate 1; dielectric pillars 20 formed above the substrate 1; and a plurality of second metal layers 30 being formed on the dielectric posts 20 and being electrically insulated from the first metal layer 10. The plurality of second metal layers 30 is disposed side-by-side at a first pitch P1 in a first direction and constitutes metal arrays. The analyzer comprises: an electric field enhancement element 100 where the metal arrays are disposed side-by-side at a second pitch P2 in a second direction intersecting with the first direction; a light source irradiating the electric field enhancement element 100 with incident light; and a detector detecting light radiated from the electric field enhancement element. Arrangement of the second metal layers 30 of the electric field enhancement element 100 and a distance G[nm] between the first metal layer 10 and the second metal layers 30 are optimized so as to increase a plasmon enhancement effect.
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Inventors:
SUGIMOTO MAMORU
ENARI MEGUMI
ENARI MEGUMI
Application Number:
JP2014095954A
Publication Date:
November 26, 2015
Filing Date:
May 07, 2014
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
G01N21/65; G01N21/41; G01N21/64
Domestic Patent References:
| JP2009222507A | 2009-10-01 | |||
| JP2013234941A | 2013-11-21 | |||
| JP2008268188A | 2008-11-06 | |||
| JP2007192806A | 2007-08-02 |
Foreign References:
| US20110128536A1 | 2011-06-02 | |||
| US20110116089A1 | 2011-05-19 | |||
| WO2013154770A1 | 2013-10-17 |
Attorney, Agent or Firm:
Yukio Fuse
Mitsue Obuchi
Mitsue Obuchi