ANGLE-RESOLVED ANTISYMMETRIC LIGHT WAVE SCATTEROMETRY

Title:

ANGLE-RESOLVED ANTISYMMETRIC LIGHT WAVE SCATTEROMETRY

Document Type and Number:

Japanese Patent JP2016014674

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide a method for determining an overlay offset amount of an object to be measured having an overlay structure.SOLUTION: A method for determining an overlay offset includes: obtaining a first antisymmetric differential signal ΔS1 associated with a first scatterometry cell 1010; obtaining a second antisymmetric differential signal ΔS2 associated with a second scatterometry cell 1020; and computing an overlay offset from the first antisymmetric differential signal ΔS1 associated with the first scatterometry cell and the second antisymmetric differential signal ΔS2 associated with the second scatterometry cell 1030.

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Inventors:

DANIEL KANDEL
VLADIMIR LEVINSKI
NOAM SAPIENS

Application Number:

JP2015150643A

Publication Date:

January 28, 2016

Filing Date:

July 30, 2015

Export Citation:

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Assignee:

KLA TENCOR CORP

International Classes:

G01B11/02; G01J4/04; G03F9/00

Attorney, Agent or Firm:

Meisei International Patent Office

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