Title:
ANODICALLY OXIDIZED ALUMINUM ELECTRODE FOR PLASMA CVD AND ETCHING
Document Type and Number:
Japanese Patent JPH08319573
Kind Code:
A
Abstract:
PURPOSE: To prevent the destruction of an electrode caused by the presence of inclusions in an aluminum alloy and to eliminate the dispersion of the product service life of an electrode for generating plasma without causing the rise of the cost.
CONSTITUTION: On the plasma contact face in an alminum alloy constituting an electrode stock, pure aluminum is precipitated by prescribed film thickness by vapor growth, and furthermore, the whole body is subjected to anodic oxidation treatment to form a film. In the film, impurity grains are not present.
Inventors:
MONZEN KAZUYUKI
WADA SUSUMU
MATSUBAYASHI YUSUKE
TOKUSHIMA TADAO
WADA SUSUMU
MATSUBAYASHI YUSUKE
TOKUSHIMA TADAO
Application Number:
JP14672995A
Publication Date:
December 03, 1996
Filing Date:
May 22, 1995
Export Citation:
Assignee:
NITSUKOOSHI PROD KK
International Classes:
H05H1/46; C23C14/14; C23C16/50; C23F4/00; C25D11/04; H01L21/205; H01L21/302; H01L21/3065; H01L21/31; (IPC1-7): C23C16/50; C23C14/14; C23F4/00; C25D11/04; H01L21/205; H01L21/3065; H01L21/31; H05H1/46
Attorney, Agent or Firm:
Mitsumasa Ishii
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