Title:
アンテナ、プラズマ処理装置および基板の処理方法
Document Type and Number:
Japanese Patent JP4869059
Kind Code:
B2
Abstract:
The invention provides a method, for processing a substrate. The substrate is placed in a chamber, where the chamber comprises a substrate holder within the chamber and a dielectric window forming a side of the chamber. A gas is provided into the chamber. An antenna is used to generate an azimuthally symmetric electric field. A substantially azimuthally symmetric plasma is formed from the gas using the azimuthally symmetric electric field. A substantially uniform process rate is produced across a surface of a substrate.
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Inventors:
Wilcoxson Mark H.
Bailey Andrew Di. The Third
Bailey Andrew Di. The Third
Application Number:
JP2006503590A
Publication Date:
February 01, 2012
Filing Date:
February 12, 2004
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
H05H1/46; C23C16/507; H01J37/32; H01L21/3065; H01Q1/36; H01Q7/00
Domestic Patent References:
| JPH10125497A | 1998-05-15 | |||
| JP2001516944A | 2001-10-02 | |||
| JP2003517197A | 2003-05-20 | |||
| JP2001085196A | 2001-03-30 |
Foreign References:
| WO2003012821A2 | 2003-02-13 | |||
| KR20030008856A | 2003-01-29 |
Attorney, Agent or Firm:
Meisei International Patent Office