Title:
金属、誘電体および窒化物適合性を有する、反射防止コーティング洗浄およびエッチング後残留物除去組成物
Document Type and Number:
Japanese Patent JP7018989
Kind Code:
B2
Abstract:
A liquid removal composition and process for removing anti-reflective coating (ARC) material and/or post-etch residue from a substrate having same thereon. The composition achieves at least partial removal of ARC material and/or post-etch residue in the manufacture of integrated circuitry with minimal etching of metal species on the substrate, such as aluminum, copper and cobalt alloys, and without damage to low-k dielectric and nitride-containing materials employed in the semiconductor architecture.
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Inventors:
Cooper, Emmanuel, Ai.
Lippy, Stephen
Song, Lin Yang
Lippy, Stephen
Song, Lin Yang
Application Number:
JP2020092560A
Publication Date:
February 14, 2022
Filing Date:
May 27, 2020
Export Citation:
Assignee:
Entegris Incorporated
International Classes:
C11D17/08; C11D7/04; C11D7/28; C11D7/32; C11D7/50; H01L21/304; H01L21/306
Domestic Patent References:
| JP2008546036A | ||||
| JP2013258214A | ||||
| JP2007519942A | ||||
| JP2008543060A |
Foreign References:
| WO2013101907A1 | ||||
| WO2007120259A2 | ||||
| US5698503 |
Attorney, Agent or Firm:
Sonoda/Kobayashi Patent Business Corporation
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