To provide an anti-reflective coating composition that does not crosslink prior to a bake stage in microlithographic processes so as to solve problems of spin bowl incompatibility and stability of an anti-reflective coating.
The anti-reflective composition includes a polymer dissolved or dispersed in a solvent system, a crosslinking agent, a light attenuating compound and a strong acid. The polymer is selected from a group consisting of acrylic polymers, polyesters, epoxy novolacs, polysaccharides, polyethers, polyimides and mixtures thereof. The crosslinking agent is selected from a group consisting of amino resin and epoxy resin. The light attenuating compound is selected from a group consisting of phenolic compounds, carboxylic acid, phosphoric acid, cyano compounds, benzene, naphthalene and anthracene. The composition contains the strong acid by less than 1.0 mass% based upon the total mass of the composition taken as 100 mass%.
MEADOR JIM D
BHAVE MANDAR
KRISHNAMURTHY VANDANA
NOWAK KELLY A
FOWLER MICHELLE
DESHPANDE SHREERAM V
| JP2000187331A | 2000-07-04 |
Haruko Sanwa
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