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Title:
抗菌・脱臭装置
Document Type and Number:
Japanese Patent JP5156957
Kind Code:
B2
Abstract:

To provide an antibacterial and deodorizing device which is easily mounted at a half way of an air flow path and enables a maintenance cost to keep low while allowing a maintenance work to be easily carried out and recovers its decomposing and adsorbing capacities by a simple maintenance work and is semipermanently used.

The antibacterial and deodorizing device has a machine frame 12 communicating with the air flow path 14, a photocatalyst filter 16 which is detachably attached to the machine frame 12 and is interposed in the air flow path 14, and a light source 18 installed in the vicinity of the photocatalyst filter 16. The photocatalyst filter 16 includes a thick platelike porous high-strength molding with continuous gaps which carries a photocatalyst and is arranged with its plate surface directed almost orthogonal to the direction of air flow.

COPYRIGHT: (C)2007,JPO&INPIT


Inventors:
Masahiko Yamazoe
Narimatsu Tomonori
Application Number:
JP2006073736A
Publication Date:
March 06, 2013
Filing Date:
March 17, 2006
Export Citation:
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Assignee:
Reiju Construction Industry Co., Ltd.
International Classes:
B01D53/86; A01K1/00; A01K1/035; A61L9/00; A61L9/18; B01J35/02
Domestic Patent References:
JP2001293069A
JP2001246228A
JP2003070885A
JP2001293334A
JP2000042364A
JP2001158229A
Attorney, Agent or Firm:
Anami Kensaku