Title:
抗菌性粒子、その製造方法および抗菌性組成物
Document Type and Number:
Japanese Patent JP5158876
Kind Code:
B2
Abstract:
The object of this invention is to provide antimicrobial particles that can maintain, for a long period of time, antimicrobial activities in particular the antimicrobial activities after they come in contact with tap water. This invention includes antimicrobial particles formed of a compound of the following formula (1), a process for the preparation thereof and an antimicrobial composition containing the said particles,
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ[Ag a B 1-a ]b[M n+ c Al 1-cn/3 ] d A x (SO 4 ) y (OH) z ·pH 2 O€ƒ€ƒ€ƒ€ƒ€ƒ(1)
wherein B is at least one monovalent cation selected from the group consisting of Na + , NH 4 + , K + and H 3 O + , M n+ is a metal ion composed mainly of Cu 2+ , n is a valence number of the metal ion and A is an anion mainly composed of an organic acid.
Inventors:
Takeshi Imahashi
Yoshie Inoue
Wang Xingdong
Yoshie Inoue
Wang Xingdong
Application Number:
JP2008552201A
Publication Date:
March 06, 2013
Filing Date:
December 28, 2007
Export Citation:
Assignee:
Kyowa Chemical Industry Co., Ltd.
International Classes:
A01N59/16; A01N25/12; A01N37/04; A01N37/36; A01N37/40; A01N59/06; A01N59/20; A01P3/00
Domestic Patent References:
| JPH03275627A | 1991-12-06 | |||
| JPH03275627A | 1991-12-06 |
Foreign References:
| WO2005085168A1 | 2005-09-15 | |||
| WO2006109847A1 | 2006-10-19 | |||
| WO2007004713A1 | 2007-01-11 | |||
| WO2005085168A1 | 2005-09-15 | |||
| WO2006109847A1 | 2006-10-19 | |||
| WO2007004713A1 | 2007-01-11 |
Attorney, Agent or Firm:
Masataka Oshima
Taizo Shiraishi
Hideo Katsumata
Taizo Shiraishi
Hideo Katsumata
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