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Title:
ANTIFUNGAL POLYMER COMPOSITION
Document Type and Number:
Japanese Patent JPH08188670
Kind Code:
A
Abstract:

PURPOSE: To obtain an antifungal polymer compsn. excellent in antifungal properties and resistances to weather, light, heat, and discoloration by incorporating a polymer with a crystalline antifungal compsn. mainly comprising crystalline silicon dioxide contg. specific metal ions into the compsn.

CONSTITUTION: This compsn. contains a polymer (e.g. PP) and a crystalline antifungal compsn. in an amt. of pref. 0.2wt.% or higher, still pref. 0.2-20wt.%. The crystalline antifungal compsn. mainly comprises crystalline silicon dioxide contg. silver ions or silver and zinc and/or copper ions and pref. contains at least 70wt.% crystalline silicon dioxide and at least 0.3wt.% silver ions. The antifungal polymer compsn. pref. has a bulk density of 0.4-1.4 and if necessary further contains one or more additives selected from among titanium oxide, TBZ, zirconia, and talc.


Inventors:
HAGIWARA ZENJI
KISHIMOTO KAZUO
YAMAZAKI HIROSHI
Application Number:
JP1995000018794
Publication Date:
July 23, 1996
Filing Date:
January 12, 1995
Export Citation:
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Assignee:
HAGIWARA GIKEN KK
NIPPON DENSHI ZAIRYO KK
TEIJIN CHEMICALS LTD
International Classes:
A01N25/10; A01N25/08; A01N59/16; A01N59/20; C08K3/00; C08K3/34; C08K3/36; C08K9/02; C08L101/00; (IPC1-7): C08K3/36; A01N25/10; A01N59/16; A01N59/20; C08K9/02; C08L101/00
Attorney, Agent or Firm:
千田 稔 (外1名)