To obtain a cosmetic that has excellent antimicrobial action, shows not only no primary skin irritation and sensitiveness but also gives no unpleasant feeling to skin such piquant, tingling or irritant pain, when it is applied.

This antimicrobial and low irritation cosmetic contains an extract from a plant in Symphytum, particularly comfrey (Symphytum officinale L) and one, two or more kinds selected from the group consisting of p- hydroxybenzoic esters, phenoxyethanol, photo-sensitizer No.101 (platonin), photo- sensitizer No.201 (pionin), photo-sensitizer No.401 (luminex), hinokitiol, an N-long chain acyl basic amino acid derivative and its acid adduct and zinc oxide.