ANTIMICROBIAL POLYMER MATERIAL AND ITS PRODUCTION

Japanese Patent JP3081916

B2

PROBLEM TO BE SOLVED: To prepare an antimicrobial polymer material excellent in resistance to washing and dry cleaning by introducing a chemically combinable spacer into a polymer material and then by making an antimicrobial metal ion coordinate with it.
SOLUTION: This antimicrobial polymer material is prepared by introducing a chemically combinable spacer such as a polybasic acid or a polyphenol compound, e.g. ethylenediaminetetraacetic acid into at least one polymer material selected from a group consisting of an animal protein fiber, a natural cellulose fiber, a diacetate fiber and a polyamide fiber (or without the above treatment) and then by making an antimicrobial metal ion (from e.g. silver, copper, cobalt, zinc, nickel, iron, zirconium, manganese, tin, chromium, or the like) coordinate with the polymer material. It is possible to previously subject the polymer material to graft copolymerization treatment with a vinyl compound and then to introduce a polyphenol compound as a spacer, followed by making the above antimicrobial metal ion coordinate with the polymer material.

Masuhiro Tsukada
Takayuki Arai
Ritsuko Murakami

JP24413098A

August 28, 2000

August 28, 1998

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Director, Silkworm and Insect Agricultural Technology Research Institute, Ministry of Agriculture, Forestry and Fisheries

C08J7/06; A01N25/10; A01N59/16; A01N59/20; D06M11/00; D06M11/32; D06M13/02; D06M13/322; D06M13/342; D06M23/00; D06M101/00; D06M101/02; D06M101/06; D06M101/08; D06M101/10; D06M101/16; D06M101/30; D06M101/34; (IPC1-7): D06M11/32; A01N25/10; A01N59/16; A01N59/20; C08J7/06; D06M13/342

JP57617A
JP8232169A
JP73651A
JP7138875A

Kinichi Kitamura (3 others)

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