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Title:
ANTIREFLECTION AGENT, ANTIREFLECTION MATERIAL, PROTECTION FILM FOR POLARIZING PLATE, AND POLARIZING PLATE
Document Type and Number:
Japanese Patent JP3804735
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain an antireflection material which exhibits a high surface hardness, a high scratch resistance, an excellent durability, a low reflectance, a high light transmission, a good adhesion to a transparent material, and an excellent film-forming capability by using at least two fluoromonomers. SOLUTION: At least two fluoromonomers selected from among monomers represented by formulas I to V are used, provided at least two of the fluoromonomers used are selected from different groups of formulas I to V. In the formulas, X1 and X2 are each H or methyl; Rf is a 2-12C fluoroalkyl group having at least three fluorine atoms or a 4-12C cyclofluoroalkyl group having at least four fluorine atoms; and Y and Z are each 2-12C alkyl, 4-12C cycloalkyl, 2-12C fluoroalkyl, or 4-12C cyclofluoroalkyl provided at least either Y or Z contains a fluorine atom or atoms. The fluoromonomers, together with a photopolymerizable monomer, are applied to a transparent substrate and polymerized by the irradiation with light to form an antireflection layer.

Inventors:
Hideyuki Nakai
Nobuyuki Takiyama
Toru Kobayashi
Hasegawa Mitsuyo
Application Number:
JP33619398A
Publication Date:
August 02, 2006
Filing Date:
November 26, 1998
Export Citation:
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Assignee:
Konica Minolta Holdings Co., Ltd.
International Classes:
G02B1/10; B32B7/02; B32B27/30; C08F2/48; C08F220/20; C08F220/24; C08F222/18; C08F232/04; G02B1/111; G02B1/14; G02B5/30; (IPC1-7): C08F220/24; B32B7/02; B32B27/30; C08F2/48; C08F220/20; C08F222/18; C08F232/04; G02B1/10; G02B5/30
Domestic Patent References:
JP6136064A
JP7168138A
JP63210115A
JP10282307A
JP10000728A
Attorney, Agent or Firm:
Katsumi Utaka