To provide an antireflection film having an antistatic function, a high adhesive property between a hardcoat layer and an antireflection layer and excellent resistance to scratch and wear and surface hardness, and a method for manufacturing the same.

The antireflection film comprises an antireflection layer laminated on a substrate film via a conductive hardcoat layer. In this case, the conductive hardcoat layer in made to have 2-35 atomic % ratio of Si in the composition of elements on the surface with respect to the sum total of Si, C and O either by compounding or by applying electric discharge treatment to achieve the ratio. The antireflection layer is laminated on the hardcoat surface.