To obtain an antireflection film having low reflectance and excellent in stickiness and wear resistance by vapor-depositing and laminating an oxide such as Al2O3, TiO2 or ZrO2 on a Faraday rotator made of a garnet single crystal and further vapor-depositing and laminating SiO2 on the resultant laminated structure.
A cleaned Faraday rotator 1 made of a garnet single crystal is irradiated with oxygen ions in a chamber 2, gaseous oxygen is introduced into the chamber 2 and granular Al2O3, TiO2, ZrO2, Ta2O5, HfO2 or Y2O3 5 packed in a crucible 4 is evaporated with an electron gun 6 to form a film of the oxide on the rotator 1 by vapor deposition in a proper optical thickness. The introduction of gaseous oxygen is then stopped and granular SiO2 9 packed in a crucible 8 is evaporated with an electron gun 10 to form an SiO2 film by vapor deposition in a proper optical thickness.
WATANABE TOSHIAKI
TANNO MASAYUKI
RIYUUOU TOSHIHIKO
| JPH01253709A | 1989-10-11 | |||
| JPH0256811A | 1990-02-26 | |||
| JPH04230701A | 1992-08-19 | |||
| JPH07172868A | 1995-07-11 | |||
| JPS62123401A | 1987-06-04 |