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Title:
ANTIREFLECTION FILM MATERIAL AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP3829914
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a refined antireflection film material having high dimensional accuracy and high accuracy of alignment and capable of forming a resist pattern with good reproducibility.
SOLUTION: The antireflection film material is a water-soluble antireflection film material containing a perfluorocarbon polymer having a sulfonyl group in a side chain.


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Inventors:
Jun Hatakeyama
Yuji Harada
Jun Watanabe
Application Number:
JP2000311396A
Publication Date:
October 04, 2006
Filing Date:
October 12, 2000
Export Citation:
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Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/11; C08J7/04; H01L21/027; (IPC1-7): G03F7/11; C08J7/04; H01L21/027; //C08L101:00
Domestic Patent References:
JP8044066A
JP2001133984A
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yoshihiro Nagare



 
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