Title:
ANTIREFLECTION FILM MATERIAL
Document Type and Number:
Japanese Patent JP3967466
Kind Code:
B
Abstract:
PROBLEM TO BE SOLVED: To form an antireflection film on a resist without using chlorofluorocarbons by incorporating a water-soluble polymer, at least one fluoroalkylsulfonic acid, at least one alkanolamine and at least one amide deriv.
SOLUTION: This antireflection film material comprises an aq. soln. contg. a water-soluble polymer, at least one fluoroalkylsulfonic acid, at least one alkanolamine and at least one amide deriv. The water-soluble polymer acts chiefly as a base polymer, is preferably soluble even in a hydrophilic org. solvent and includes an N-vinylpyrrolidone/vinyl acetate copolymer. The fluoroalkylsulfonic acid is preferably a 4-12C fluoroalkylsulfonic acid excellent in compatibility with the water-soluble polymer. The alkanolamine is preferably a ≤12C alkanolamine such as ethanolamine. The amide deriv. is preferably a ≤8C amide deriv. such as formamide.
Inventors:
Watanabe, Satoshi
Nagura, Shigehiro
Ishihara, Toshinobu
Nagura, Shigehiro
Ishihara, Toshinobu
Application Number:
JP1998000189867
Publication Date:
June 08, 2007
Filing Date:
June 19, 1998
Export Citation:
Assignee:
SHIN ETSU CHEM CO LTD
International Classes:
G03F7/11; C08K5/17; C08K5/20; C08K5/42; C08L39/06; C08L101/14; H01L21/027; (IPC1-7): G03F7/11; C08K5/17; C08K5/20; C08K5/42; C08L39/06; C08L101/14; H01L21/027