Title:
ANTIREFLECTION OPTICAL MATERIAL AND ITS MANUFACTURE
Document Type and Number:
Japanese Patent JPH04191701
Kind Code:
A
Abstract:
PURPOSE:To dispense with skillfulness, a complex device and complicated operation by applying low temperature plasma processing to the material surface of a transparent high molecular material, and by improving transmissivity of light on a wavelength band 400 - 500nm. CONSTITUTION:The material surface of a transparent high molecular material is low-temperature-plasma-processed simultaneously with a fluorine organic high molecular compound. In this case, a silicone hard coat material is etched in the surface territory, and a antireflection film of porous layers made of SiOx and FxC-SiOx of low refractive index is manufactured by way of decomposing it. Visible radiation, especially transmissivity of light on a wavelength band 400 - 500nm of an antireflection optical material of porous layers acquired in this way is very large in comparison with other wavelength bands and its reflectance is small. In this case, high temperature of vacuum deposition and high vacuum of ion plating are not required, and there is neither complexity of a device nor complication of operation.
Inventors:
NISHIKAWA AKIFUMI
TOMOTA SHIGERU
KAGEI KAZUNORI
TSUJIHATA KAZUHIKO
SAKAGOSHI NOBUYUKI
TOMOTA SHIGERU
KAGEI KAZUNORI
TSUJIHATA KAZUHIKO
SAKAGOSHI NOBUYUKI
Application Number:
JP32414990A
Publication Date:
July 10, 1992
Filing Date:
November 26, 1990
Export Citation:
Assignee:
NISHIKAWA AKIFUMI
ASAHI OPUTEIKARU KK
NIHON HEKISOU KK
TODOROKI SANGIYOU KK
ASAHI OPUTEIKARU KK
NIHON HEKISOU KK
TODOROKI SANGIYOU KK
International Classes:
G02B1/12; C08J7/04; C08J7/18; C08L23/00; C08L27/00; C08L27/12; C08L83/00; C08L83/02; C08L83/04; C08L87/00; C09D5/00; C09D183/04; (IPC1-7): C08J7/04; C08J7/18; C08L27/12; C08L83/04; C09D5/00; C09D183/04; G02B1/12
Domestic Patent References:
| JPH02154201A | 1990-06-13 | |||
| JPH0274901A | 1990-03-14 |