To provide an antistatic agent which is excellent in the prevention of film-thinning phenomenon and fogging in chemically amplified resists, an antistatic film using the antistatic agent and an article coated therewith.

The antistatic agent comprises a water-soluble electroconductive polymer, a solvent and a water-soluble polymer. By using a specific water-soluble polymer, especially a specific water-soluble polymer compound having a polyvinyl structure in combination with a water-soluble electroconductive polymer in an antistatic agent, influences on a resist (such as dissolution of the resist and fogging and film-thinning phenomena after developing a resist) can be suppressed even when a surfactant is added into the antistatic agent for the purpose of imparting coatability inexpensively and easily, while maintaining coatability of the agent. The antistatic agent having improved coatability by the incorporation of a surfactant has mixing inhibition effect on a chemically amplified resist and a non-chemically amplified resist.