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Title:
ANTISTATIC ANTIREFLECTION FILM, METHOD FOR MANUFACTURING ANTISTATIC ANTIREFLECTION FILM, POLARIZING PLATE, AND IMAGE DISPLAY APPARATUS
Document Type and Number:
Japanese Patent JP2017040936
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an antistatic antireflection film which is excellent in antireflection properties and antistatic properties and is free from a planar failure and excellent in scratch resistance, abrasion resistance, and antifouling properties.SOLUTION: An antistatic antireflection film comprises, on a support, a hard coat layer formed of a hard coat layer composition containing at least a compound having a quaternary ammonium salt group and a low refractive index layer formed of a composition for the low refractive index layer containing at least the following (a), (b), (c) and (d) in this order. (a) is a fluorine-containing polymer containing an ethylenically unsaturated group, (b) is a fluorine-containing polyfunctional monomer having surface free energy of 23 mN/m or more when a film is formed alone, no -CFgroup in a molecule, a fluorine content of 30% or more and at least three reactive functional groups in one molecule, (c) is hollow silica fine particles having an average particle diameter of 10 nm to 100 nm, and (d) is a compound having a dimethylsiloxane skeleton.SELECTED DRAWING: None

Inventors:
WAKIZAKA DAIKI
FUKUDA KENICHI
Application Number:
JP2016215436A
Publication Date:
February 23, 2017
Filing Date:
November 02, 2016
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
G02B1/10; G02B1/111; B32B7/02; C08F2/44; C08F259/08; C08F283/12; C08F292/00; G02B1/11; G02B1/14; G02B1/16; G02B1/18; G02B5/30; G02F1/1335; H01L51/50; H05B33/02
Domestic Patent References:
JP2013130865A2013-07-04
JP2011225846A2011-11-10
JP2010085759A2010-04-15
JP2010083813A2010-04-15
JP2008107792A2008-05-08
JP2010085983A2010-04-15
Foreign References:
WO2011142429A12011-11-17
Attorney, Agent or Firm:
Patent Business Corporation Koei Patent Office
Takeshi Takamatsu
Toshiyuki Ozawa