Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ANTISTATIC POLYMER COMPOSITION
Document Type and Number:
Japanese Patent JPH01236256
Kind Code:
A
Abstract:

PURPOSE: To obtain the title composition excelling in processability such as formability into films and adhesiveness and forming a transparent smooth ultra- thin film, by mixing a polymer compound mainly consisting of specified groups with a 7,7,8,8-tetracyanoquinodimethane complex.

CONSTITUTION: A polymer compound mainly consisting of groups of formula I (wherein R is H, CH3 or C4H9) and 0.1W70wt.%, based on this compound, 7,7,8,8-tetracyanoquinodimethane (hereinbelow abbreviated to TCNQ) complex, i.e., a complex of D+.TCNQ-.TCNQ0 (wherein D+ is a cation of any one of formulas IIWXVII, R1, R3 and R4 are each H or a 1W12C alkyl group, R2 is H, a 1W30C alkyl group, a benzyl group or a phenylethyl group, and X is O or S) are dissolved in, for example, a solvent (e.g., acetonitrile or cyclohexanone) and applied to a base and, the solvent is evaporated from the base.


Inventors:
NAKAMURA TOMIO
SHIMIZU SHIGERU
SATO TAKASHIO
Application Number:
JP6440088A
Publication Date:
September 21, 1989
Filing Date:
March 16, 1988
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NITTO CHEMICAL INDUSTRY CO LTD
International Classes:
C08L29/14; C08K5/16; (IPC1-7): C08K5/16; C08L29/14
Attorney, Agent or Firm:
Morio Sada (2 outside)