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Patent Searching and Data


Title:
ANTISTATIC POLYPHENYLENE ETHER RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPH04202256
Kind Code:
A
Abstract:
PURPOSE:To prepare the title compsn. which is permanently antistatic and excellent in strengths, moldability, etc., by compounding a polyphenylene ether resin with specified amts. of a polyamide resin and a specific polyamideimide elastomer. CONSTITUTION:100 pts.wt. resin mixture comprising 25-70wt.% polyphenylene ether resin, 25-70wt.% polyamide resin, and 0-25wt.% rubberlike material is compounded with 2-40 pts.wt. polyamideimide elastomer having a relative viscosity at 30 deg.C of 1. 5 or higher and prepd. by mixing caprolactam, an arom. tri- or tetracarboxylic acid capable of forming at least one imide ring, and polyoxyethylene glycol or a polyoxyalkylene glycol mixture mainly comprising polyoxyethylene glycol, thus giving the title compsn., which is suitable as the material of a housing, mechanical part, etc., of a mechanical section for handling coins in an automatic vending machine.

Inventors:
HOSONUMA NOBUYUKI
NAKADA SHINJI
Application Number:
JP32537890A
Publication Date:
July 23, 1992
Filing Date:
November 29, 1990
Export Citation:
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Assignee:
ASAHI CHEMICAL IND
International Classes:
C08K5/09; C08G71/02; C08L21/00; C08L53/00; C08L53/02; C08L71/02; C08L71/12; C08L77/00; C08L79/08; H01B1/20; (IPC1-7): C08G71/02; C08K5/09; C08L53/02; C08L71/12; C08L77/00; C08L79/08; H01B1/20