Title:
ANTISTATIC RESIN COMPOSITION, METHOD FOR PRODUCING ANTISTATIC RESIN COMPOSITION, AND ELECTRONIC COMPONENT PACKAGING MATERIAL
Document Type and Number:
Japanese Patent JP2021193169
Kind Code:
A
Abstract:
To provide an antistatic resin composition which exhibits excellent antistatic performance and is excellent in transparency.SOLUTION: An antistatic resin composition contains a block copolymer (b) and a donor-acceptor-based molecular compound (c), in which the block copolymer (b) is a block copolymer including a vinyl aromatic hydrocarbon monomer unit and a conjugated diene monomer unit, and has a polymer block mainly containing the vinyl aromatic hydrocarbon monomer unit, the vinyl aromatic hydrocarbon monomer unit is 30-90 mass% and the conjugated diene monomer unit is 70-10 mass%, and when the total amount of the block copolymer (b) and the donor-acceptor-based molecular compound (c) is 100 mass%, a content of the donor-acceptor-based molecular compound (c) is 0.5 mass% or more and 5 mass% or less.SELECTED DRAWING: None
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Inventors:
SATO NAOHIKO
Application Number:
JP2020099517A
Publication Date:
December 23, 2021
Filing Date:
June 08, 2020
Export Citation:
Assignee:
ASAHI KASEI CORP
International Classes:
C08L53/02; B65D73/02; C08F293/00; C08K5/20; C08K5/55
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito