ANTISTATIC RESIN COMPOSITION - TORAY INDUSTRIES

Title:

ANTISTATIC RESIN COMPOSITION

Document Type and Number:

Japanese Patent JPS6023435

Kind Code:

A

Abstract:

PURPOSE: To provide a composition composed of a specific polyether ester amide and a carboxyl-containing modified vinyl polymer mixed with each other in high compatibility, and having permanent antistaticity and excellent mechanical properties.

CONSTITUTION: The objective composition is produced by mixing (A) 5W80(wt%), preferably 10W60% polyether ester amide composed of (i) ≥6C aminocarboxylic acid or lactam or ≥6C salt of diamine and dicarboxylic acid, (ii) a poly(alkylene oxide) glycol having a number-average molecular weight of 200W6,000, preferably 250W2,000 and (iii) a 4W20C dicarboxylic acid and (B) 95W20%, preferably 90W40% modified vinyl polymer containing carboxyl group. The component A is preferably the one derived from hexamethylenediamine-adipic acid, polyethylene glycol, terephthalic acid, etc.

Inventors:

TANAKA MASAYUKI
KISHIMOTO AKIHIKO
HIRAI TOSHIMASA

Application Number:

JP13128683A

Publication Date:

February 06, 1985

Filing Date:

July 19, 1983

Export Citation:

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Assignee:

TORAY INDUSTRIES

International Classes:

C08L25/08; C08L7/00; C08L21/00; C08L23/00; C08L25/00; C08L33/00; C08L33/02; C08L33/04; C08L35/00; C08L35/06; C08L67/00; C08L73/00; C08L77/00; C08L77/12; C08L101/00; (IPC1-7): C08L25/08; C08L33/04; C08L35/06; C08L77/12

Domestic Patent References:

JPS57147519A	1982-09-11
JPS58118838A	1983-07-15
JPS4825410A	1973-04-03
JPS59193959A	1984-11-02
JPS5662844A	1981-05-29
JPS4724677A

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