ANTISTATIC RESIN COMPOSITION

Title:

ANTISTATIC RESIN COMPOSITION

Document Type and Number:

Japanese Patent JP61246244

Kind Code:

A

Abstract:

PURPOSE: To provide the titled compsn. having excellent impact resistance, consisting of a polyether ester amide, a graft copolymer and a copolymer of a vinyl monomer.

CONSTITUTION: 5W80pts. (by weight; the same applies hereinbelow) polyether ester amide (A) contg. 95W10% polyether ester unit, composed of 6C or higher amino-carboxylic acid or lactam or a salt of 6C or higher diamine with a dicarboxylic acid, 1W95pts. graft polymer (B) obtd. from 5W80pts. rubbery polymer and 95W20pts. monomer (mixture) consisting of 100W40% (meth)acrylate ester monomer (a) and/or arom vinyl monomer (h) and 0W60% other vinyl monomer copolymerizable therewith and 0W90pts. copolymer (C) composed of 100W60% component (a) and/or component (b) and 0W40% vinyl cyanide are blended together to obtain 100pts. the titled compsn.

More Like This:

JP51114453	A METHOD FOR MANUFACTURING A COLORED MOLDED ORTICLE
JP06271760	LIGHTWEIGHT REINFORCED RESIN COMPOSITION
JP3799641	FINE METAL PARTICLE-CONTAINING POLYMER PARTICLE AND PRODUCTION THEREOF

Inventors:

Fukumoto, Tadao
Iwamoto, Masatoshi
Kishimoto, Akihiko

Application Number:

JP1985000089465

Publication Date:

November 01, 1986

Filing Date:

April 25, 1985

Export Citation:

Click for automatic bibliography generation Help

Assignee:

TORAY IND INC

International Classes:

C08L25/00; C08L7/00; C08L21/00; C08L23/00; C08L25/14; C08L33/00; C08L33/02; C08L33/04; C08L33/06; C08L51/00; C08L51/02; C08L51/04; C08L67/00; C08L67/02; C08L73/00; C08L77/00; C08L77/12; C08L101/00; (IPC1-7): C08L25/14; C08L51/04; C08L67/02; C08L77/12

Previous Patent: IMPACT-RESISTANT RESIN COMPOSITION HAVING EXCELLENT ABILITY OF COLOR FORMING AND RESISTANCE TO THERM...

Next Patent: PRODUCTION OF THERMOSETTING RESIN