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Patent Searching and Data


Title:
ANTISTATIC RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPS5536238
Kind Code:
A
Abstract:

PURPOSE: To prepare the title composition having high antistaticity even after washing and excellent processability, and useful as an electrical equipment, etc. by adding a surface active agent to a graft copolymer obtained by grafting an unsaturated nitrile, etc. to a rubber-like backbone polymer composed of a conjugated diolefin, etc.

CONSTITUTION: A resin composition composed of (A) 100 parts by weight of a nitrile graft copolymer obtained by grafting (a) 20W95wt% of a mixture composed of 20W90wt% of an unsaturated nitrile and 10W80wt% of a vinyl or vinylidene monomer copolymerizable to the nitrile [e.g. (meth)acrylic acid ester] to (b) 5W80wt% of rubber-like backbone polymer composed mainly of a conjugated diolefin and/or an acrylic acid ester, and (B) 0.05W5 parts by weight of an antistatic agent consisting of a surface active agent such as an alkylsulfonic acid salt (excluding polyoxyethylene alkyl ether).


Inventors:
OOYA MASAKI
KOBAYASHI AKIO
OGIWARA TAKEO
SATAKE YOSHIKATSU
Application Number:
JP10928578A
Publication Date:
March 13, 1980
Filing Date:
September 06, 1978
Export Citation:
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Assignee:
KUREHA CHEMICAL IND CO LTD
International Classes:
C08K5/00; C08L51/00; C08L7/00; C08L21/00; C08L33/00; C08L33/02; C08L51/02; C08L51/04; (IPC1-7): C08L51/04