Title:
ANTISTATIC SILICONE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2023018425
Kind Code:
A
Abstract:
To provide an antistatic silicone resin composition which is excellent in antistatic property.SOLUTION: An antistatic silicone resin composition (X) is provided which contains polysiloxane (A) having an ethylenically unsaturated bond and/or a hydrosilyl group, and a nanocarbon material (B), wherein a weight of the (B) based on the weight of the (A) is 0.01-0.5 wt.%. An antistatic silicone resin layer is provided which contains a reaction product of the antistatic silicone resin composition (X). An antistatic adhesive film is provided which has the antistatic silicone resin layer on at least a part of at least one surface of a base material.SELECTED DRAWING: None
Inventors:
IKEDA YOSHIHIRO
Application Number:
JP2021122549A
Publication Date:
February 08, 2023
Filing Date:
July 27, 2021
Export Citation:
Assignee:
SANYO CHEMICAL IND LTD
International Classes:
C08L83/07; C08K3/04; C08L83/05; C09K3/16; H05F1/00
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