Title:
APPARATUS FOR CHAMFERING PRISMATIC SILICON INGOT AND METHOD OF CHAMFERING PRISMATIC SILICON INGOT USING THE SAME
Document Type and Number:
Japanese Patent JP2010207949
Kind Code:
A
Abstract:
To provide an apparatus for chamfering a prismatic silicon ingot with a short throughput time and a compact footprint.
In the apparatus for chamfering, by four clamp mechanisms (3, 3, 3, 3) each having a spindle base and a tailstock disposed vertically on an index type rotary table (2), which are disposed at equally spaced intervals on the same circle, the index type rotary table (2) is divided into a loading/unloading stage (s1), a rough grinding stage (s2) for circular arcs of corner parts of a workpiece, a both-side surface grinding stage (s3) for the workpiece, and a round chamfering finish grinding stage (s4) for the workpiece. A chamfering throughput time of the prismatic silicon ingot is a sum of both sides surface grinding time at the both-side surface grinding stage (s3) being a rate controlling process, and approximately 10 seconds required for a 90-degree rotation of the index type rotary table (2).
COPYRIGHT: (C)2010,JPO&INPIT
Inventors:
SAITO KOJI
KOBAYASHI KAZUO
KIDA HIROAKI
KUBO TOMIO
Application Number:
JP2009055904A
Publication Date:
September 24, 2010
Filing Date:
March 10, 2009
Assignee:
OKAMOTO MACHINE TOOL WORKS
International Classes:
B24B9/00; B24B1/00; H01L21/304
