PURPOSE: To obtain an apparatus being suitable to in-line production which can continuously form the film for a long time by providing the apparatus with a holding table for plural crucible and driving mechanism thereof, vapor- deposition raw material supplement mechanism and preheating mechanism for crucible in the thin film forming apparatus with cluster ion beam vapor- deposition method.
CONSTITUTION: A turn table 31 as holding table driving mechanism is ascended and two pieces of crucibles 3 in a preparing chamber 29 are inserted into a vaporizing source 12 and preheating mechanism 37. Successively, the crucible 3 is preheated with the preheating mechanism 37 and the vapor-deposition raw material wire rod 4a is sent in the crucible 3 and the tip part thereof is melted, and after supplying the necessary quantity, the wire rod 4a is retreated and the crucible 3 is successively preheated to execute degassing in the raw material. By ascending this crucible 3 after descending the table 31 and turning by 180° angle, the crucible is inserted into the vaporizing source 12 and heated up to the temp. to be cluster beam forming temp. to use it for film forming process. Then, to the crucible 3 inserted into the preheating mechanism 37, the same operation as the above is pre-executed.
YAMANISHI KENICHIRO
YOSHIDA KAZUO
