APPARATUS FOR LITHOGRAPHY AND METHOD OF MANUFACTURING DEVICE - AJMEL Netherlands Lands Beth Rotten Fuennaught Shap

Title:

APPARATUS FOR LITHOGRAPHY AND METHOD OF MANUFACTURING DEVICE

Document Type and Number:

Japanese Patent JP3676779

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a projection apparatus for lithography having a planar magnetic positioning means that can be automatically self-recovered and that suppresses mechanical load applied to guide pipes that are mounted on a substrate table to the smallest extent.
SOLUTION: This projection apparatus for lithography has a planar magnetic positioning means with which movement of the substrate table in a plane is accomplished, and a mechanical limiter that limits rotation of the substrate table around a direction normal to the plane.

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Inventors:

Hernes Jacobs
Harmen, Kras van der Short
Petrus Mathews Henrix Vostels
Tonde Grote

Application Number:

JP2002383104A

Publication Date:

July 27, 2005

Filing Date:

December 09, 2002

Export Citation:

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Assignee:

AJMEL Netherlands Lands Beth Rotten Fuennaught Shap

International Classes:

G03F7/20; H01L21/027; H01L21/68; (IPC1-7): H01L21/027; G03F7/20; H01L21/68

Domestic Patent References:

JP2001203140A
JP5092335A
JP8055787A
JP5121294A
JP10223527A
JP2001351856A

Foreign References:

WO2001018944A1

Attorney, Agent or Firm:

Hideto Asamura
Hajime Asamura
Toru Mori
Yutaka Yoshida

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