Title:
APPARATUS AND METHOD FOR ALIGNING, ALIGNER APPARATUS USING THE SAME AND MANUFACTURE OF SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP3244783
Kind Code:
B2
Abstract:
PURPOSE: To accurately align a plurality of objects (e.g. a mask and a wafer).
CONSTITUTION: The aligning apparatus comprises an alignment detector (2) for detecting deviations of a mask 4 and a wafer 6 from specified positional relationship (relationship in which an alignment is performed), a stage mechanism 13, etc., for relatively moving the wafer 6 to the mask (4), and interference measuring means 9, 10, 11, 12 for measuring moving information of the mechanism 13, etc., and obtains a detected value of the detector and measured values of the means 9, 10, 11, 12 at the same timing. The apparatus is constituted to so obtain an operation command value to the mechanism 13, etc., that the positional relationship between the mask 4 and the wafer 6 becomes the specified positional relationship is obtained based on the obtained values to move a stage according to the command value.
Inventors:
Tetsushi Nose
Naoto Abe
Naoto Abe
Application Number:
JP19094692A
Publication Date:
January 07, 2002
Filing Date:
July 17, 1992
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F9/00; H01L21/027; H01L21/30; (IPC1-7): H01L21/027; G03F9/00
Domestic Patent References:
| JP4148810A | ||||
| JP2269902A |
Attorney, Agent or Firm:
Keizo Nishiyama (1 person outside)
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