Title:
APPARATUS AND METHOD FOR APPLYING FLUX
Document Type and Number:
Japanese Patent JP2004148189
Kind Code:
A
Abstract:
To provide an apparatus and a method for applying a flux, by which a flux coating without dispersion can be realized on a specimen with a simple configuration.
A specimen holding means 4 for holding a specimen 30 for a solder wetting test is arranged above a liquid flux housing vessel 31. A dropping mechanism for dropping the vessel 31 from the position that the specimen 30 is immersed in the flux 32 while keeping the specimen 30 holding position to remove the flux-immersed part of the specimen 30 from the flux 32 so that the flux 32 is applied to the specimen 30.
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Inventors:
SAITO TAKASHI
Application Number:
JP2002315732A
Publication Date:
May 27, 2004
Filing Date:
October 30, 2002
Export Citation:
Assignee:
SONY CORP
International Classes:
B05D1/18; B05C3/02; (IPC1-7): B05C3/02; B05D1/18
Attorney, Agent or Firm:
Yasuo Iisaka
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