To provide an apparatus capable of increasing the use frequency of a vapor deposition mask and improving the reuse efficiency of a vapor deposition agent by efficiently cleaning the vapor deposition mask for an organic EL element and efficiently recovering the vapor deposition agent.
The vapor deposition agent is separated from the vapor deposition mask 2 by irradiating the vapor deposition mask 2 with pulse laser 10. The vapor deposition agent is sucked from a suction nozzle 3 and separated from air by a cyclone 6 to be deposited on the bottom of cyclone 6. After that, the vapor deposition agent is recovered in a vapor deposition agent recovering part 7 by opening a valve 12. Next, a valve 13 is opened to move the vapor deposition agent to a vapor deposition agent purifying part 8 to purify the vapor deposition agent. A valve 14 is opened and the purified vapor deposition agent is stored in the vapor deposition agent storing part 9. As a result, the vapor deposition mask 2 is cleaned without damage and the vapor deposition agent is recovered with high efficiency.
KATAOKA FUMIO
YUMIBA KENJI
KATAGIRI KENJI
IZAKI MAKOTO
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