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Title:
APPARATUS AND METHOD FOR EXPOSING SEMICONDUCTOR
Document Type and Number:
Japanese Patent JPH07161625
Kind Code:
A
Abstract:

PURPOSE: To provide a semiconductor aligner without exposing resist at the time of alignment or at the time of auto-focusing.

CONSTITUTION: This semiconductor aligner has (a) laser light source 10, (b) a second-harmonic-wave generator 20 comprising a nonlinear optical crystal element and an optical resonator, (c) a resonator-length control device 30, which controls the resonator length of the optical resonator so as to control the level of the intensity of the light emitted from the second-harmonic-wave generator 20, and (d) an optical projecting system 62. A TTL-type alignment detecting system 40 or an auto-focusing device is provided. (A) The high-intensity light emitted from the second-harmonic-wave generator 20 is used as the light source for the optical projecting system. (B) The low-intensity light emitted from the second-harmonic-wave generator 20 is used as the light source for the TTL-type alignment detecting system or as the light source of the auto-focusing device.


Inventors:
IKEDA RIKIO
Application Number:
JP33877293A
Publication Date:
June 23, 1995
Filing Date:
December 02, 1993
Export Citation:
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Assignee:
SONY CORP
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Attorney, Agent or Firm:
Takahisa Yamamoto