To provide an apparatus and a method for exposure, which accurately and stably detects temperature at a plurality of positions in a chamber and which will not bring about exposure faults caused by misdetecting of the temperature.

The apparatus for exposure comprises an exposure apparatus body EX housed in the chamber, temperature detectors 61a and 61b provided near laser interferometers 39a and 39b for detecting the position of a mask stage MST, temperature detectors 62a and 62b provided near the interferometers 43a and 43b for detecting the position of a substrate stage PST, and an operating state detector CONT, for comparing differences of detected results of any two of the plurality of the detectors 61a, 61b, 62a and 62b and detecting the operating states of a plurality of the detectors 61a, 61b, 62a and 62b.