To uniformly heat a wafer as well as to efficiently heat a guard-ring.

Lamps L1-L10 of a light source 1 consist of lamps L1-L8 for heating the wafer and lamps L9, L10 for heating the guard ring. The distance from the lamps L9, L10 for heating the guard ring to the guard ring 3 is larger than that from the lamps L1-L8 for heating the wafer to the wafer W. A side wall 4 between the lamps L1-L8 and the lamps L9, L10 is finished to be a mirror face, so that as to the light radiated from the lamps L9, L10 toward the wafer W is reflected toward the guard ring 3. Also a second side wall 5 is formed in the circumference of the lamps L9, L10 for heating the guard ring, making the side wall 5 a reflecting face. Furthermore, in the circumference of the guard ring 3, a second mirror 6 is provided, to concentrate the light radiated on the outer side of the guard ring 3, to the guard ring 3.