To provide an inspecting apparatus and method which allows an accurate inspection by preventing the flying secondary electrons unrelated to observations.
An electron beam 13 is radiated on a prescribed position of a semiconductor wafer 2 from an electron gun 11 for observation installed on the observation side 10, and the secondary electrons 14 emitted from the irradiation of the electron beam is collected by a secondary electron collector 12 which serves as an secondary electron detector, to observe the condition of the secondary electrons emitted from the prescribed position. At that time, an electron beam 23 is radiated near the prescribed position from an electron beam 21 for special purpose for irradiation of beams installed on the beam irradiation side 20. At the same time, an electron beam shielding plate 3 is installed between the observation side 10 and the beam irradiation side 20 to prevent the secondary electrons 25 flying in all directions to the observation side 10 from the beam irradiation side 20.
| JP2001007172A | 2001-01-12 | |||
| JP2000340628A | 2000-12-08 | |||
| JP2001305194A | 2001-10-31 | |||
| JPH1116967A | 1999-01-22 | |||
| JPS6327033A | 1988-02-04 |
Yasuhisa Tanizawa
Kawai Nobuaki