To provide an apparatus and a method for manufacturing a thin film, wherein the frequency of changing a vapor deposition vessel is reduced and the vapor deposition cost is reduced by preventing any crack or breakage of the vapor deposition vessel while securing a passage for executing the volumetric change in thermal expansion of a vapor deposition material.
The thin film manufacturing apparatus 100 for executing the film deposition on a surface of a substrate 4 by using the vacuum vapor deposition includes: a vapor deposition raw material; a vessel 16 for storing the vapor deposition raw material; a heating means 17 for heating the vapor deposition raw material stored in the vessel 16; and a pipe 50 for communicating the lower side from a melting surface of the vapor deposition raw material with the upper side of the melting surface thereof when the heating means 17 heats and melts the vapor deposition raw material.
COPYRIGHT: (C)2011,JPO&INPIT
HONDA KAZUYOSHI
Daisuke Nagano
Kentaro Fujii